ASML
ASML's High-NA EUV Tools: Powering the Sub-2nm Era and Reshaping the Semiconductor Landscape
ASML's (AMS: ASML) groundbreaking High-Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) lithography tools, specifically the TWINSCAN EXE:5000 and its successor, the TWINSCAN EXE:5200B, are rapidly becoming the cornerstone of cutting-edge chip manufacturing. These advanced systems are crucial for pushing the boundaries of Moore's Law, enabling